CVD growth system is to produce chemical reaction using a mixture of gaseous compounds on the substrate surface, thus generating non-volatile coating on substrate surface, a kind of thin film material preparation system. It consists of vacuum tube furnace, multi-channel pneumatic system and vacuum system. CVD growth system is suitable for the CVD process, such as silicon carbide coating, ceramic substrate conductivity test, controlled growth of ZnO nanostructures, such as ceramic capacitors (MLCC) atmosphere sintering experiment.

CVD vacuum system can equip turbo molecular pump system or diffusion pump system, vacuum degree is up to 0.001pa;multi channels gas supply system can equip float flow meter or mass flow meter, which features wide measure range and high accuracy; meanwhile other different function and purpose can be designed according to specific requirement.